Published in:
01-03-2013 | Original Article
Influence of caries infiltrant contamination on shear bond strength of different adhesives to dentin
Authors:
Liuhe Jia, Bogna Stawarczyk, Patrick R. Schmidlin, Thomas Attin, Annette Wiegand
Published in:
Clinical Oral Investigations
|
Issue 2/2013
Login to get access
Abstract
Objectives
To analyze whether the contamination with a caries infiltrant system impairs the adhesive performance of etch-and-rinse and self-etching adhesives on dentin.
Materials and methods
Dentin contamination with the caries infiltrant system (Icon, DMG) was simulated by applying either hydrochloric acid (15 % HCl, Icon Etch, 15 s), the resin infiltrant (Icon infiltrant, 4 min), or both prior to the application of the respective adhesives (each group n = 10). In the control groups, the etch-and-rinse adhesive (Optibond FL, Kerr) and the self-etching adhesive (iBOND Self Etch, Hereaus) were applied without former contamination with the infiltrant system. Additionally, the adhesive performance of the resin infiltrant alone was tested. Shear bond strength of a nano-hybrid composite was analyzed after thermocycling (5,000×, 5–55°C) of the specimens and analyzed by ANOVA/Scheffé post hoc tests (p < 0.05) and Weibull statistics. Failure mode was inspected under a stereomicroscope at × 25 magnification.
Results
Contamination with the resin infiltrant alone did not impair shear bond strength, while contamination with hydrochloric acid or with hydrochloric acid and the resin infiltrant reduced shear bond strength (MPa) of the adhesives (Optibond FL: 20.5 ± 3.6, iBOND Self Etch: 17.9 ± 2.6) significantly. Hydrochloric acid contamination increased the number of adhesive failures. The adhesive performance of the caries infiltrant system alone was insufficient.
Conclusion
The contamination with the caries infiltrant system impaired the shear bond strength of conventional dental adhesives.
Clinical relevance
Contamination of the caries infiltrant system on dentin should be avoided due to the detrimental effect of hydrochloric acid etching.