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Production of Fullerenes by Low Temperature Plasma Chemical Vaper Deposition under Atmospheric Pressure

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Copyright (c) 1994 The Japan Society of Applied Physics
, , Citation Kiyoto Inomata et al 1994 Jpn. J. Appl. Phys. 33 L197 DOI 10.1143/JJAP.33.L197

1347-4065/33/2A/L197

Abstract

A gas phase reactor developed for generating homogenous low temperature plasma under atmospheric pressure was found to provide a new method for producing fullerenes by a plasma chemical vapor deposition (CVD) process. Into an afterglow region of atmospheric pressure Ar–He mixed gas plasma, an aromatic hydrocarbon was introduced and decomposed into black soot under appropriate reaction conditions. A benzene solution of the soot showed two clear HPLC peaks with retention times corresponding well to those of C60 and C70. The formation of C60 was further confirmed by UV spectroscopy.

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10.1143/JJAP.33.L197